Focused ION Beam Technology: Applications to Microelectronics

April 11, 2017 @ 5:30 pm – 7:45 pm America/New York Timezone
MIT Lincoln Laboratory
3 Forbes Rd
Lexington, MA 02421

Reliability Society


5:30-6:00 PM: Sign in, refreshments, and personal networking
6:00-6:10 PM: Chapter Chair greetings and announcements
6:10-7:30 PM: Marsha Abramo, IEEE Distinguished Lecturer
7:30-7:45 PM: Q&A session, meeting adjourns

Focused Ion Beam Technology: Applications to Microelectronics

Marsha Abramo, Advisory Engineer – Scientist (Retired), IEEE Distinguished Lecturer

World Wide Analytical Services Laboratory

IBM Systems and Technology Group

During the past two decades focused ion beam (FIB) systems have become indispensable tools in the arsenal of analytical techniques available to failure analysts and integrated circuit designers. FIB systems are similar to scanning electron microscopes (SEM) in that a charged particle beam is generated, raster scanned, and used for high resolution imaging. In addition, the use of massive Ga ions permits the FIB system to be used for both material removal (milling) and deposition, enabling applications such as precision cross sectioning and circuit modification. This presentation will review the fundamentals of FIB systems, describe a wide range of applications and discuss FIB techniques used for circuit modification and failure analysis. The reliability of FIB modified integrated circuits will also be discussed.

Marsha Abramo


Marsha Abramo received a B.S. in Chemistry from Trinity College, Burlington, VT. She joined the World Wide Analytical Services and Advanced Technology Laboratory at IBM Systems and Technology Group in 1980. As an Advisory Engineer Scientist she was responsible for laboratory development and management, supporting domestic and international clients while providing leadership to a team of failure analysts.

Prior to her retirement in 2008, her primary areas of interest were in microelectronic application development and technology transfer related to plasma and ion beam physics for failure analysis applications. She has authored and co-authored numerous conference papers and journal articles.
She is a senior member of the IEEE and has been an active volunteer supporting technical conferences and workshops for 20 years. She has also served as the Vice President Membership of the IEEE Reliability Society as well as the Vice President for Conferences and Meetings. She is currently serving as a member of the IEEE Reliability Society Administrative Committee and is the society liaison to IEEE Women in Engineering.

Marsha is also currently serving as a member of the Board of Directors of the IEEE International Reliability Physics Symposium and is a member of the Electron Device Failure Analysis Society (EDFAS).

Meeting Location: MIT Lincoln Laboratory, 3 Forbes Road, Lexington, MA.